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Film deposition by laser-induced vacuum arc evaporation

Filmabscheidung durch laserinduzierte Vakuumbogenverdampfung
: Siemroth, P.; Scheibe, H.J.


IEEE transactions on plasma science 18 (1990), No.6, pp.917-922 : Abb.,Lit.
ISSN: 0093-3813
Journal Article
Fraunhofer IWS ()
a-C film; DLC-film; harte amorphe Kunststoffschicht; Hartstoffschichtung; Kohlenstoff-Schichten; Laser-Arc; laser induced film deposition; laserinduzierte Schichtabscheidung; LPVD; PVD-Technik; vacuum arc deposition; Vakuumbogenbeschichtung; Vielfachschichtstruktur

The method of laser-induced arc evaporation (laser-arc) combines the advantages of the laser-pulse vapor deposition (LPVD) technique with the technologically utilized vacuum arc evaporation (VAD). Laser-arc may be effectively and precisely controlled like LPVD, but its energy efficiency and properties of the deposits equal those obtained by the vacuum arc. In the present paper the latest results of the study of the deposition process and the technological development of the laser-arc are presented. Studies of the influence of arc current on film deposition were carried out for different materials (Ti,TiC,C). On the basis of these results definite mutlilayered structures are prepared. As an example, a Ti/TiC multilayer system with 25-nm single layers is described. Results of structural and chemical analysis by means of AES spectroscopy are presented. It could be shown that diamond-like carbon film with a refractive index in a range of between 2.05 and 2.5 can be deposited effectively.