• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Fabrication of high breakdown pseudomorphic doped field effect transistors using double dry etched gate recess technology in combination with e-beam T-gate lithography
 
  • Details
  • Full
Options
1994
Journal Article
Title

Fabrication of high breakdown pseudomorphic doped field effect transistors using double dry etched gate recess technology in combination with e-beam T-gate lithography

Other Title
Herstellung von pseudomorphen modulationsdotierten Feldeffekttransistoren mit hoher Durchbruchspannung unter Verwendung einer doppelt trockengeätzten Gate-Recess Technologie in Kombination mit E-Beam T-Gate Litographie
Abstract
We have developed a technology to fabricate pseudomorphic 0.3micrometer gatelength modulation doped field-effect transistors (MODFETs ) having a brakdown voltage up to 20 Volts. This technology uses mmolecular beam epitaxy (MBE) to grow the InGaAs/AlGaAs/GaAs heterostructure with two pulse doping layers on 3 inch semiisolating GaAs wafers. A mix and match lithography was applied using an i-line stepper and an eledtron beam diect write process to define the mushroom shaped gates (T-gates). The breakdown enhancement is achieved by a self aligned selective double dry etched gate recess using AlGaAs etch stop layers. We investigated the heterostructure doping and influence of the gate recess process to the device performance.
Author(s)
Hülsmann, A.
Bronner, Wolfgang  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Braunstein, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Tasker, P.J.
Journal
Japanese Journal of Applied Physics. Part 1, Regular papers, short notes and review papers  
DOI
10.1143/JJAP.33.7194
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • breakdown voltage

  • Durchbruchspannung

  • Gate-recess

  • pseudomorphe MODFET

  • pseudomorphic MODFET

  • T-gate

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024