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  4. Enhanced CAIBE for high-speed OEICs
 
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1994
Journal Article
Title

Enhanced CAIBE for high-speed OEICs

Other Title
Verbesserter CAIBE-Prozess für Hochgeschwindigkeits-OEICs
Abstract
Researchers at the Fraunhofer Institute for Applied Solid-State Physics (IAF, Freiburg, Germany), working with Technics Plasma GmbH (Kirchheim, Germany), have developed a UHV CAIBE system specially designed for the fabrication of GaAs-based OEICs. The Fraunhofer team has also developed an enhanced CAIBE etching process which relaxes a number of constraints previously reported in the dry-etching of Al (ind x) Ga (ind 1-x) As-containing optoelectronic device structures.
Author(s)
Ralston, J.D.
Eisele, K.
Sah, R.E.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Fleissner, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bronner, Wolfgang  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Hornung, J.
Raynor, B.
Journal
III-Vs Review  
DOI
10.1016/0961-1290(94)90070-1
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • high-speed data transmission

  • Hochgeschwindigkeitsdatenübertragung

  • monolithic integration

  • monolithische Integration

  • OEIC

  • QW-laser

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