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1994
Journal Article
Titel
Enhanced CAIBE for high-speed OEICs
Alternative
Verbesserter CAIBE-Prozess für Hochgeschwindigkeits-OEICs
Abstract
Researchers at the Fraunhofer Institute for Applied Solid-State Physics (IAF, Freiburg, Germany), working with Technics Plasma GmbH (Kirchheim, Germany), have developed a UHV CAIBE system specially designed for the fabrication of GaAs-based OEICs. The Fraunhofer team has also developed an enhanced CAIBE etching process which relaxes a number of constraints previously reported in the dry-etching of Al (ind x) Ga (ind 1-x) As-containing optoelectronic device structures.
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