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Enhanced CAIBE for high-speed OEICs

Verbesserter CAIBE-Prozess für Hochgeschwindigkeits-OEICs

: Ralston, J.D.; Eisele, K.; Sah, R.E.; Fleissner, J.; Bronner, W.; Hornung, J.; Raynor, B.

	III-Vs Review 7 (1994), No.5, pp.51-55 : Abb. ISSN: 0959-3527 ISSN: 0961-1290

	English
	Journal Article
	Fraunhofer IAF ()
	high-speed data transmission; Hochgeschwindigkeitsdatenübertragung; monolithic integration; monolithische Integration; OEIC; QW-laser

Abstract
Researchers at the Fraunhofer Institute for Applied Solid-State Physics (IAF, Freiburg, Germany), working with Technics Plasma GmbH (Kirchheim, Germany), have developed a UHV CAIBE system specially designed for the fabrication of GaAs-based OEICs. The Fraunhofer team has also developed an enhanced CAIBE etching process which relaxes a number of constraints previously reported in the dry-etching of Al (ind x) Ga (ind 1-x) As-containing optoelectronic device structures.

: http://publica.fraunhofer.de/documents/PX-12185.html