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Einsatz der Corona-Entladung für die Abscheidung dünner Schichten

 
: Thyen, R.; Weber, A.; Klages, C.-P.

Platin-Plasmatechnologie-Initiative NRW, Wuppertal:
PLATIN-Seminar 1997. Entschichten und Reinigen von Oberflächen mit Plasmaverfahren
Essen, 1997
Platin-Seminar <1997, Essen>
German
Conference Paper
Fraunhofer IST ()
Atmosphärendruck-Plasma; Barrierenentladung; Beschichtungsrate; Coronaentladung; Dünnschichttechnik; dynamische Beschichtungrsrate; fluorierte Kohlenstoffschicht; Oberflächenenergie; polymerähnliche Kohlenwasserstoffschicht; Siliciumoxid

Abstract
he corona discharge (also called dielectric barrier discharge or silent discharge) is a non- thermal transient gas discharge which can be operated at atmospheric pressure. A novel application of the corona discharge, the deposition of thin films, is discussed regarding economic aspects. Due to the lack of any vaccum equipment the corona discharge is a promising technique for economic inline deposition processes, especially for the finishing of large sized low cost products such as metal bands, polymer foils, paper or textiles. Different types of thin films are presented. Siliconoxide films can be obtained by using siliconorganic precursors. Polymerlike hydrogenated or fluorinated carbon films were deposited using hydrogenated or fluorinated carbon, respectivly.

: http://publica.fraunhofer.de/documents/PX-11299.html