• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Einsatz der Corona-Entladung für die Abscheidung dünner Schichten
 
  • Details
  • Full
Options
1997
Conference Paper
Title

Einsatz der Corona-Entladung für die Abscheidung dünner Schichten

Abstract
he corona discharge (also called dielectric barrier discharge or silent discharge) is a non- thermal transient gas discharge which can be operated at atmospheric pressure. A novel application of the corona discharge, the deposition of thin films, is discussed regarding economic aspects. Due to the lack of any vaccum equipment the corona discharge is a promising technique for economic inline deposition processes, especially for the finishing of large sized low cost products such as metal bands, polymer foils, paper or textiles. Different types of thin films are presented. Siliconoxide films can be obtained by using siliconorganic precursors. Polymerlike hydrogenated or fluorinated carbon films were deposited using hydrogenated or fluorinated carbon, respectivly.
Author(s)
Thyen, R.
Weber, A.
Klages, C.-P.
Mainwork
PLATIN-Seminar 1997. Entschichten und Reinigen von Oberflächen mit Plasmaverfahren  
Conference
Platin-Seminar 1997  
Language
German
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
Keyword(s)
  • Atmosphärendruck-Plasma

  • Barrierenentladung

  • Beschichtungsrate

  • Coronaentladung

  • Dünnschichttechnik

  • dynamische Beschichtungrsrate

  • fluorierte Kohlenstoffschicht

  • Oberflächenenergie

  • polymerähnliche Kohlenwasserstoffschicht

  • Siliciumoxid

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024