English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing
Details
Full
Export
Statistics
Options
1984
Journal Article
Titel
Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing
Author(s)
Klausmann, E.
Eisele, K.M.
Zeitschrift
Solid state technology
Language
English
google-scholar
View Details
Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Tags
Getterwirkung
Lebensdauer
Minoritaetstraeger
Phosphorsilikatglas
Schwermetallverunreinigung