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Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
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1996
Journal Article
Titel
Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
Author(s)
Zywitzki, O.
Hoetzsch, G.
Fietzke, F.
Goedicke, K.
Zeitschrift
Surface and coatings technology
DOI
10.1016/0257-8972(95)00270-7
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP