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Effect of spatial localization of dopant atoms of the spacing of electron subbands in delta-doped GaAs-Si.

Einfluss der räumlichen Lokalisierung der Dotieratome auf den Abstand elektronischer Subbänder in delta-dotierten GaAs-Si
 

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Applied Physics Letters 58 (1991), No.2, pp.143-145 : Abb.,Tab.,Lit.
ISSN: 0003-6951
ISSN: 1077-3118
English
Journal Article
Fraunhofer IAF ()
delta-doping; Delta-Dotierung; dopant distribution; electronic structure; elektronische Struktur; GaAs; Verteilung der Dotieratome

Abstract
Using Raman spectroscopy we have investigated the spacing or the electron subbands in nominally delta-doped GaAs structures which show a considerable spread of the silicon dopant atoms along the growth direction. For optical excitation in resonance with the E sub 0 and Delta sub 0 band gap, spin-density intersubband excitations are observed. For excitation in resonance with the E sub 1 band gap we find a strong enhancement of scattering by collective intersubband plasmon-phonon modes. The measured energy spacings between the electron subbands deviate significantly from what is expected for ideal delta doping. Self-consistent electronic subband calculations taking into account the spread of the dopant atoms along the growth direction, in contrast, yield a good quantitative agreement between calculated and measured subband spacings. This demonstrates the potential of intersubband Raman spectroscopy for the analysis of the spatial localization of dopant atoms in delta-doped structures.

: http://publica.fraunhofer.de/documents/PX-10628.html