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E-beam written optically transparent x-ray masks - four levels for an industrial VLSI chip with megabit design rules

 

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Microelectronic engineering 17 (1992), No.1-4, pp.161-165
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <17, 1991, Rome>
English
Conference Paper
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/PX-10458.html