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E-beam two-coordinate measuring tool for high precision metrology in micro-lithographie

 
: Betz, H.; Heuberger, A.; Somers, J.M.; Bruenger, W.H.

Microcircuit Engineering '83. International Conference on Microlithography
1983
International Conference on Microlithography <1983, Los Angeles>
English
Conference Paper
Fraunhofer IFT; 2000 dem IZM eingegliedert
Elektronenstrahl; Hochintegration; Lithographie

Abstract
Design criteria and performance data for the E-Beam Measuring Tool (EBMT-5; Cambridge Instruments Ltd.) are presented. Repeatability tests give positional accuracies of 3 sigma