1989
Conference Paper
Title

The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making

Author(s)
Dammel, R.
Demmeler, R.
Ehrlich, C.
Kohlmann, K.
Lingnau, J.
Pongratz, S.
Reimer, K.
Scheunemann, U.
Theis, J.
Mainwork
Conference
Language
English