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The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
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1989
Conference Paper
Titel
The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Author(s)
Dammel, R.
Demmeler, R.
Ehrlich, C.
Kohlmann, K.
Lingnau, J.
Pongratz, S.
Reimer, K.
Scheunemann, U.
Theis, J.
Hauptwerk
Electron-beam x-ray and ion-beam technlogy. Submicrometer lithographies VIII
Konferenz
Society of Photo-Optical Instrumentation Engineers (Conference) 1989
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT