Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making

 
: Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.

Yanof, A.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Electron-beam x-ray and ion-beam technlogy. Submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
Bellingham, Wash.: SPIE, 1989 (Proceedings of SPIE 1089)
ISBN: 0-8194-0124-2
Society of Photo-Optical Instrumentation Engineers (Conference) <1989, San Jose/Calif.>
English
Conference Paper
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/PX-10451.html