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2001
Book Article
Titel
A Spatial Light Modulator (SLM) for advanced lithography
Abstract
Using a newly developed SLM it is possible to build a photomask writer tool that fulfills all specifications for the 0.13 node. It is furthermore possible to extend the new architecture to several future generations of maskwriters by shifting to shorter laser wavelengths, larger SLM-chips and a higher demagnifying optical system. This technology combines the high resolution of e-beam writers with the high productivity of laser writers to a potentially very powerful photomask production tool architecture.