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The importance of non-local shadowing for the topography evolution of a-C:H films grown by toluene based plasma enhanced chemical vapor deposition

: Hormann, C.; Meier, S.; Moseler, M.

Preprint urn:nbn:de:0011-n-961545 (395 KByte PDF)
MD5 Fingerprint: e7286d2617c098c45cc8bbadce536f73
The original publication is available at
Created on: 25.3.2011

The European physical journal. B, Condensed matter physics 69 (2009), No.2, pp.187-194
ISSN: 1434-6028
Journal Article, Electronic Publication
Fraunhofer IWM ()
kuramoto-sivashinsky equation; surface diffusion; interface growth; glow discharge; 2+1 dimension; instability; carbon; model; ion; simulation

The topography evolution of hydrogenated diamond-like carbon coatings deposited through toluene based capacitively coupled plasma enhanced chemical vapor deposition has been studied experimentally and with continuum growth models. The experimentally observed mound formation and surprisingly large growth exponents (beta a parts per thousand 0.9 +/- 0.1) cannot be reproduced by familiar local stochastic differential equations that are successfully used for other thin film deposition techniques. Here we introduce a novel numerical approach to simulate a continuum growth model that takes into account non-local shadowing effects. We show that the major characteristics of the experimentally observed topography evolution can be accurately represented by this model.