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Ultrathin membranes in x-cut lithium niobate

: Schrempel, F.; Gischkat, T.; Hartung, H.; Höche, T.; Kley, E.-B.; Tünnermann, A.; Wesch, W.


Optics Letters 34 (2009), No.9, pp.1426-1428
ISSN: 0146-9592
Journal Article
Fraunhofer IOF ()
crystal LINBO3 films; thin film; epitaxial liftoff

Ion-beam enhanced etching is used to pattern a bulk lithium niobate crystal with ultrathin membranes. By the implementation of an air gap beneath the membrane, high index contrast is achieved. A buried amorphous layer, created by irradiation with He ions, is removed by means of wet chemical etching in hydrofluoric acid. Membranes having thicknesses down to 200 nm are fabricated. The etched air gaps and the membranes exhibit a uniform thickness over the entire etched area, and their widths can be purposefully adjusted over a wide range by choosing appropriate ion energies and fluences as well as annealing conditions. (C) 2009 Optical Society of America