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Isotropic dry-etching of SiC for AlGaN/GaN MEMS fabrication

 
: Niebelschütz, F.; Pezoldt, J.; Stauden, T.; Cimalla, V.; Tonisch, K.; Brueckner, K.; Hein, M.; Ambacher, O.; Schober, A.

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Faraone, L. ; Institute of Electrical and Electronics Engineers -IEEE-:
COMMAD 2008, Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings : 28 July - 1 August 2008, Sydney, Australia; In conjunction with the IUMRS-ICEM 2008 International Conference on Electronic Materials
Piscataway/NJ: IEEE, 2008
ISBN: 978-1-4244-2717-8
ISBN: 978-1-4244-2716-1
pp.26-29
Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD) <7, 2008, Sydney>
International Conference on Electronic Materials (ICEM) <2008, Sydney>
English
Conference Paper
Fraunhofer IAF ()

: http://publica.fraunhofer.de/documents/N-93684.html