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2000
Journal Article
Titel
Manufacturing technologies for miniaturized interference filters
Abstract
Miniaturized interference filters were designed and fabricated using two different manufacturing technologies. Applying micromachined ceramic masks during the coating processes interference filters with 1 mm lateral feature size and an alignment accuracy of 50 pm were arranged in an array consisting of three different filters. The filter edge definition obtained by this method was smaller than 50 pm. By applying ion assisted deposition (IAD), a low-temperature coating process, the spectral sensitivity of receiver cells has been modified by coating the cells directly. A combination of coating processes, microlithographic masking procedures, and dry etching technologies made it possible to arrange three different stripe filters with minimum filter features of about 5 mu m side by side. The accuracy during mask alignment and the filter edge definition was also within 1 and 2 mu m, respectively.