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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique

: Shao, F.; Evanschitzky, P.; Reibold, D.; Erdmann, A.


Behringer, U.F.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik -GMM-:
EMLC 2008, 24th European Mask and Lithography Conference : 21 - 24 January 2008, Dresden, Germany
Bellingham, WA: SPIE, 2008 (SPIE Proceedings Series 6792)
ISBN: 978-0-8194-6956-4
ISSN: 0277-786X
Paper 679206
European Mask and Lithography Conference (EMLC) <24, 2008, Grenoble>
Conference Paper
Fraunhofer IISB ()
waveguide EMF solver; fast three dimensional simulation; parallelized decomposition technique

A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask simulations based on a parallelized decomposition technique (Q3D, Q stands for quasi). After a short introduction to the waveguide method and to an optimized mask description, the basis of a decomposition technique and its parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by the simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of computation time using parallelization is demonstrated.