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A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography

 
: Schnattinger, T.; Erdmann, A.

:

Henderson, C.L. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in resist materials and processing technology XXV : 25 - 27 February 2008, San Jose, California, USA
Bellingham, WA: SPIE, 2008 (SPIE Proceedings Series 6923)
ISBN: 978-0-8194-7108-6
ISSN: 0277-786X
Paper 69230R
Conference "Advances in Resist Materials and Processing Technology" <25, 2008, San Jose/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-92400.html