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Simulation of mass interferences considering charge exchange events and dissociation of molecular ions during extraction

: Häublein, V.; Frey, L.; Ryssel, H.


Seebauer, E.G.:
Ion implantation technology 2008. 17th International Conference on Ion Implantation Technology, IIT 2008 : Monterey, California, 8 - 13 June 2008
Melville/NY: AIP Press, 2008 (AIP Conference Proceedings 1066)
ISBN: 978-0-7354-0597-4
ISSN: 0094-243X
International Conference on Ion Implantation Technology (IIT) <17, 2008, Monterey/Calif.>
Conference Paper
Fraunhofer IISB ()

Contamination due to mass interferences generally leads to severe problems in ion implantation. To be able to prevent this kind of contamination, the cause of the respective mass interference has to be known. Frequently, however, the transport mechanisms of the contamination are unknown and the search for potential transport mechanisms is troublesome. Simulation of mass interferences, therefore, is an excellent means to find potential transport mechanisms. In this paper, the simulation software ENCOTION (ENergetic COntamination simulaTION) is explained. In the latest version, an enhanced model was implemented in order to calculate the apparent mass of ions. The relevance of the new model is discussed by the example of tungsten contamination in the case of BF2+ implants. A new module that allows for the simulation or mass spectra was recently added to ENCOTION as a new feature.