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2008
Conference Paper
Titel
Superimposed MF-HiPIMS processes for the deposition of ZrOO2R thin films
Abstract
In the present paper we investigated the deposition of ZrO2 layers by different HiPIMS processes. For an improved deposition rate, a modified pulse technique based on the superposition of mid-frequency (MF) bipolar pulses with unipolar high power impulse magnetron sputtering (HiPIMS) is developed. This yields to a significantly improved process stability especially suited for isulating oxides. Even higher deposition rates were obtained by the control of the HiPIMS process in the transition mode with metallic targets. Results are discussed on the basis of different optical and morphological properties of the ZrO2 films.