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Adjustment and mounting of stencil masks for ion projection lithography

 
: Damm, C.; Peschel, T.; Gebhardt, A.; Kirschstein, U.

:

Microelectronic engineering 57-58 (2001), pp.187-190
ISSN: 0167-9317
English
Journal Article
Fraunhofer IOF ()
mask; mask adjustment; lithography; ion projection lithography

Abstract
An integrated concept for mounting and adjustment of stencil masks in ion projection lithography is presented. The concept relies on a geometrical description of the mount only. Overall position accuracies below 3 µm were obtained.

: http://publica.fraunhofer.de/documents/N-8700.html