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Wafer stage assembly for ion projection lithography

 
: Damm, C.; Peschel, T.; Risse, S.; Kirschstein, U.

Microelectronic engineering 57-58 (2001), pp.181-185
ISSN: 0167-9317
English
Journal Article
Fraunhofer IOF ()
wafer stage; metrology unit; electrostatic chuck; glass ceramic; lithography; ion projection lithography

Abstract
n the framework of the Ion Projection Lithography project a wafer stage with nanometer position stability was developed. Major components were fabricated from glass ceramics to meet the requirements for mechanical and thermal stability as well as for minimum magnetic susceptibility.

: http://publica.fraunhofer.de/documents/N-8688.html