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Title
Antimikrobiell wirkendes Material sowie Verfahren zum Herstellen eines antimikrobiell wirkenden Materials
Date Issued
2006
Author(s)
Fahland, M.
Schiller, N.
Vogt, T.
Fahlteich, J.
Patent No
102006060057
Abstract
(A1) Die Erfindung betrifft ein antimikrobiell wirkendes Material und ein Verfahren zum Herstellen eines antimikrobiell wirkenden Materials, welches auf einem Substrat abgeschieden wird, umfassend die Schritte: Bereitstellen des Substrates in einer Vakuumarbeitskammer; Zerstaeuben eines biozid wirkenden Metalls mittels einer Sputtereinrichtung innerhalb der Vakuumarbeitskammer unter Anwesenheit eines Inertgases; gleichzeitiges Einlassen eines Precursors, der Silizium, Kohlenstoff, Wasserstoff und Sauerstoff enthaelt, in die Vakuumarbeitskammer, so dass die abgestaeubten Metallteilchen und der Precursor einer Plasmaeinwirkung ausgesetzt werden; Abscheiden eines Materials auf dem Substrat, derart, dass durch die Plasmaaktivierung Precursors eine Matrix entsteht, in welche Cluster von abgestaeubten Metallteilchen eingelagert werden.
DE 102006060057 A1 UPAB: 20081018 NOVELTY - The production of an antimicrobial material for cleaning and disinfecting purposes, comprises preparing a substrate (2) in a vacuum working chamber (3), atomizing a biocidal metal by a sputtering device within the working chamber in the presence of an inert gas, simultaneously introducing a precursor into the working chamber in such a way that the sputtered metal particles and the precursor are exposed to the action of a plasma, and depositing a material on the substrate in such a way that by the plasma activation of the precursor, a matrix is formed. DETAILED DESCRIPTION - The production of an antimicrobial material for cleaning and disinfecting purposes, comprises preparing a substrate (2) in a vacuum working chamber (3), atomizing a biocidal metal by a sputtering device within the working chamber in the presence of an inert gas, simultaneously introducing a precursor into the working chamber in such a way that the sputtered metal particles and the precursor are exposed to the action of a plasma, and depositing a material on the substrate in such a way that by the plasma activation of the precursor, a matrix is formed, in which clusters of sputtered metal particles with a size of 3-40 nm are incorporated. The oxygen is supplied into the working chamber. The layer thickness and concentration of the metal particles in the matrix are adjusted with the sputtering and/or the quantity of the precursors supplied per unit time into the vacuum chamber and/or the quantity of the oxygen supplied per unit time in the vacuum chamber. The concentration of the metal particles in the matrix is formed with a gradient of the substrate in such a manner that the concentration of the metal particles decreases or increases toward the substrate. A fabric or non-woven or a plastic foil is used as the substrate. A band-shaped substrate is used and is moved during of the coating continuously with constant speed by the vacuum chamber. In a given and pre-adjusted concentration of the metal particles in the matrix, the layer thickness is adjusted over the tape speed of the substrate. A single magnetron with unipolar pulsed energy injection or a double magnetron with bipolar, medium frequency pulsed energy injection is used as the sputtering mechanism. A target (6) from the biocidal metal and a target (7) from titanium are used. An INDEPENDENT CLAIM is included for an antimicrobial material. USE - Production of an antimicrobial material (claimed) for cleaning and disinfecting purposes. ADVANTAGE - The method ensures effective production of an antimicrobial material, which can mobilize fastly and does not cause unwanted side effects to the environment and persons, thus providing simple handling and pollution abatement.
Language
de
Patenprio
DE 102006060057 A: 20061219