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SIMS depth profiling of Mg back-diffusion in (AlGaIn)N light-emitting diodes

SIMS Tiefenprofile der Mg-Rückdiffusion in (AlGaIn)N-Leuchtdioden
 
: Kirste, L.; Köhler, K.; Maier, M.; Kunzer, M.; Maier, M.; Wagner, J.

:

Zeimer, U.:
Proceedings of the 12th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors, DRIP-XII 2007 : Held at Marriott Courtyard in Berlin-Köpenick, from 9th to 13th September 2007
Norwell, Mass.: Springer, 2008 (Journal of materials science. Materials in electronics 19.2008, Supplement 1)
ISSN: 0957-4522
pp.176-181
International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP) <12, 2007, Berlin>
English
Conference Paper, Journal Article
Fraunhofer IAF ()
secondary ion mass spectrometry; SIMS; Sekundärionen-Massenspektrometrie; GaN; light emitting diodes; Leuchtdiode; Mg-doping; Mg-Dotierung

Abstract
The Mg doping profiles in close proximity to the (AlGaIn)N/GaN QW active region of group III-nitride light-emitting diodes grown by low pressure metal-organic vapor-phase epitaxy on sapphire substrates were investigated by secondary ion mass spectrometry (SIMS) depth profiling. The actual Mg profiles close to the active region have been found to be influenced by segregation as well as by back-diffusion during growth and can be controlled by appropriate growth temperatures. From the Mg depth profiles we estimated an activation energy of 4.5-4.7 eV for Mg diffusion in (AlGa)N.

: http://publica.fraunhofer.de/documents/N-85499.html