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Metrology, analysis and characterization in micro- and nanotechnologies

A European Challenge
 
: Pfitzner, L.; Nutsch, A.; Öchsner, R.; Pfeffer, M.; Don, E.; Wyon, C.; Hurlebaus, M.

:

Kolbesen, B.O. ; Electrochemical Society -ECS-, Electronics and Photonics Division:
Analytical Techniques for Semiconductor Materials and Process Characterization 5, ALTECH 2007 : September 13 - September 14, 2007, Munich, Germany
Red Hook, NY: Curran, 2007 (ECS transactions 10.2007, Nr.1)
ISBN: 978-1-604-23825-9
pp.35-49
Symposium "Analytical Techniques for Semiconductor Materials and Process Characterization" (ALTECH) <5, 2007, München>
English
Conference Paper
Fraunhofer IISB ()

Abstract
Europe offers excellent expertise in the area of metrology, analysis and characterization in micro- and nanotechnologies. This exper-tise is borne through research institutes, academia, small/medium enterprises and industry. The European approach to develop syner-gies, enhance the existing technologies and to develop innovative methods is displayed by two projects named Analytical Network for Nanotech (ANNA) and Semiconductor Equipment Assessment for NanoElectronic Technologies (SEA-NET). ANNA is an infra-structure initiative focusing on the integration of independently op-erating laboratories. This multi-site laboratory forms a collabora-tive, synergistic network of analytical working scientists and pre-existing institutions. The objective of SEA-NET is to validate emerging semiconductor manufacturing equipment including me-trology tools for advanced process requirements for the next tech-nology nodes. The prototype equipment assessment is done in co-operation of tool suppliers with integrated device manufacturers and research institutes. Results of non-contact resistivity measure-ments, x-ray metrology platform and a gas detection system based on IMS technology are presented.

: http://publica.fraunhofer.de/documents/N-84182.html