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Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

 
: Philipsen, V.; Mesuda, K.; Bisschop, P. de; Erdmann, A.; Citarella, G.; Evanschitzky, P.; Birkner, R.; Richter, R.; Scherübl, T.

:

Naber, R.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; BACUS International:
Photomask Technology 2007. Pt.1 : 18 - 21 September 2007, Monterey, California, USA; papers from the SPIE Conference on Photomask Technology held as part of the 27th International Symposium on Photomask Technology
Bellingham, WA: SPIE, 2007 (SPIE Proceedings Series 6730)
ISBN: 978-0-8194-6887-1
Paper 67301N
Symposium on Photomask Technology <2007, Monterey/Calif.>
International Symposium on Photomask Technology <27, 2007, Monterey/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-84173.html