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Fast near field simulation of optical and EUV masks using the waveguide method

 
: Evanschitzky, P.; Erdmann, A.

:

Behringer, U.F.W. ; VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik -GMM-; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
EMLC 2007, 23rd European Mask and Lithography Conference : 22 - 25 January 2007, Grenoble, France
Bellingham, WA: SPIE, 2007 (SPIE Proceedings 6533)
ISBN: 978-0-8194-6655-6
ISBN: 0-8194-6655-7
Paper 65330Y
European Mask and Lithography Conference (EMLC) <23, 2007, Grenoble>
English
Conference Paper
Fraunhofer IISB ()

Abstract
A new and optimized waveguide based electromagnetic field solver for optical and EUV mask simulations is presented. After an introduction of the waveguide method, the convergence and speed optimization and the adaptation of the method to optical and EUV lithography mask simulations are presented. Additionally a model for the simulation of EUV multilayer defects and an optimized decomposition technique for three dimensional waveguide simulations enabling very fast computations as well as large mask area simulations is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV masks.

: http://publica.fraunhofer.de/documents/N-84171.html