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Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy

Poster at ICN+T 2007, International Conference on Nano Science and Technology 2007, Stockholm, Sweden
 
: Beuer, S.; Yanev, V.; Rommel, M.; Bauer, A.J.; Ryssel, H.

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Fulltext urn:nbn:de:0011-n-832071 (1.3 MByte PDF)
MD5 Fingerprint: a696ccf847a0aba2bb113092fdf003f6
Created on: 5.11.2008


2007, 1 Folie
International Conference on Nano Science and Technology (ICN+T) <2007, Stockholm>
English
Poster, Electronic Publication
Fraunhofer IISB ()
FIB induced damage; SSRM

: http://publica.fraunhofer.de/documents/N-83207.html