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Extreme ultraviolet plasma source for future lithography

: Wagenaars, E.; Mader, A.; Bergmann, K.; Jonkers, J.; Neff, W.


IEEE transactions on plasma science 36 (2008), No.4, Teil 1, pp.1280-1281
ISSN: 0093-3813
Journal Article
Fraunhofer ILT ()

An extreme ultraviolet (EUV) plasma source intended for future lithography applications is presented. The plasma source efficiently emits EUV light around 13.5 nm with 2% bandwidth. Debris mitigation and collector systems are successfully implemented to achieve a focused beam of debris-free EUV photons that can be used in EUV lithography.