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Extreme ultraviolet plasma source for future lithography

 
: Wagenaars, E.; Mader, A.; Bergmann, K.; Jonkers, J.; Neff, W.

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IEEE transactions on plasma science 36 (2008), No.4, Teil 1, pp.1280-1281
ISSN: 0093-3813
English
Journal Article
Fraunhofer ILT ()

Abstract
An extreme ultraviolet (EUV) plasma source intended for future lithography applications is presented. The plasma source efficiently emits EUV light around 13.5 nm with 2% bandwidth. Debris mitigation and collector systems are successfully implemented to achieve a focused beam of debris-free EUV photons that can be used in EUV lithography.

: http://publica.fraunhofer.de/documents/N-82890.html