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Extreme-ultraviolet-induced oxidation of Mo/Si multilayers

: Benoit, N.; Schroeder, S.; Yulin, S.; Feigl, T.; Duparre, A.; Kaiser, N.; Tünnermann, A.


Applied optics 47 (2008), No.19, pp.3455-3462
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()
synchrotron radiation; EUV; contamination; reflectance; mirror; optic; carbon

The extreme-ultraviolet (EUV)-induced oxidation of Mo/Si multilayer mirrors was characterized by several methods: EUV reflectivity, x-ray photoelectron spectroscopy, small-angle x-ray reflectometry, atomic force microscopy, and EUV scattering measurements. Based on the results of the different investigation techniques, an oxidation model was developed to explain the degradation of the mirrors under EUV radiation.