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Heat resistance of EUV multilayer mirrors for long-time applications

: Feigl, T.; Lauth, H.; Yulin, S.; Kaiser, N.


Microelectronic engineering 57/58 (2001), pp.3-8
ISSN: 0167-9317
Journal Article
Fraunhofer IOF ()
Mo/Si; Mo2C/Si; Mo/Mo2C/Si/ Mo2C; multilayer; sputtering; thermal stability; EUVL

The effect of elevated temperature on the structural stability of Mo/Si, Mo2C/Si and Mo/Mo2C/Si/Mo2C (dMo2C = 0.6 nm) multilayers was investigated. The multilayers deposited by dc magnetron sputtering are annealed at temperatures ranging from 200 °C to 700 °C. The multilayer mirrors were designed for normal incidence reflectivity at about 13 nm wavelength. We achieved maximal normal incidence reflectivities of 61.8 % @ 13.0 nm wavelength for Mo2C/Si and 59.9 % @ 13.3 nm for Mo/Si multilayers having Mo2C diffusion barriers. While the reflectivity of Mo/Si multilayers decreased considerably after annealing above 300 °C the Mo2C/Si multilayers showed a superior thermal stability up to 500 C.