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Potentials of electron beam technology in photovoltaic applications

: Morgner, H.; Metzner, C.

Advanced Coatings for Large-Area or High-Volume Products. ICCG 2008, 7th International Conference on Coatings on Glass and Plastics. Proceedings : June 15-19, 2008, NH Conference Centre Koningshof, Eindhoven/Veldhoven, the Netherlands
Eindhoven, 2008
ISBN: 978-90-5986-281-4
International Conference on Coatings on Glass and Plastics (ICCG) <7, 2008, Eindhoven>
Conference Paper
Fraunhofer FEP ()
electron beam evaporation; plasma activated deposition; zone melting crystallization; micromachining

Heat input due to the effect of electrons can be used for processing steps in thin layer photovoltaic technology. Controlled heat input allows evaporation, remelting and structuring processes. In this regard, electron beam technology is very versatile. Electron beam evaporation technology with and without additional plasma activation is a very productive method for deposition of photovoltaic functional layers like: Silicon, insulating oxide, molybdenum and transparent conductive oxide (TCO).
Electron beam treatment enables zone melting crystallization of Si-layers and micromachining of photovoltaic layer Systems.