Deposition of functional coatings on PET films by Magnetron-PECVD

Magnetron-PECVD is a new process tool which allows the deposition of plasma polymer coatings at process pressures below 1 Pa. The striking features of this technology are the relatively easy realisation of large area deposition as well as the possibility of the combination with sputtering processes for multilayer coating designs. SiOxC"" coatings were deposited on PET film in a roll-to roll deposition machine. Dynamic deposition rates as high as 160 nm-m/min was achieved. Detailed results of deposition rates and of process reliability will be presented. The coatings were analysed by Fourier transform infrared spectroscopy. This method identifies the existence of both chain-like and network-like Si-O bonding in the layer. The results show how the layer properties are linked to the plasma parameters of the deposition process. The properties will be compared to sputtered SiC>2 and to RF~ PECVD. Magnetron-PECVD can be tuned by different kinds of monomer inlets. Investigations with the monomer hexamethyldisiloxane (HMDSO) and with the monomer tetraethylorthosilicate (TEOS) will be presented.