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Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method

 
: Keil, Katja; Choi, Kang-Hoon; Hohle, Christoph; Kretz, Johannes; Lutz, Tarek; Bettin, Lutz; Boettcher, Monika; Hahmann, Peter; Kliem, Karl-Heinz; Schnabel, Bernd; Irmscher, Mathias; Sailer, Holger

:

Kristensen, A.:
33rd International Conference on Micro- and Nano-Engineering 2007. Proceedings : 23-26 September 2007, Copenhagen, Denmark
Amsterdam: Elsevier, 2008 (Microelectronic engineering 85.2008, Nr.5-6)
pp.778-781
International Conference on Micro- and Nano-Engineering (MNE) <33, 2007, Copenhagen>
English
Conference Paper, Journal Article
Fraunhofer CNT ()
variable shaped beam system; isofocal dose method; MNE

Abstract
Electron beam direct write (EBDW) provides high resoln. for device and technol. development. A new variable shaped beam system with improved electron optics was introduced, which features the capability for the 32 nm node. Because of the limited resoln. of com. available chem. amplified resists at this node, it is important to det. a stable and optimum resist process window. To compare a process window under different premises, a universally applicable and low error-prone method is needed. The isofocal dose method is investigated with regard to these properties for its use in EBDW. Expts. were performed on 50 kV variable shaped electron beam direct writers using the new electron-optical column SB3050 DW (Vistec Electron Beam GmbH). Exposures are performed at different sites in Dresden (Fraunhofer CNT/Qimonda Dresden), Jena (Vistec) and Stuttgart (IMS Chips); also patterns are exposed on different layer stacks at one site. The strong need for a process window can be fulfilled by the isofocal dose method, which will be shown by contour plots.

: http://publica.fraunhofer.de/documents/N-76851.html