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Fluessigkeitsstrahlgefuehrtes Aetzverfahren zum Materialabtrag an Festkoerpern sowie dessen Verwendung

Etching of material from the surface of solid bodies by a laminar fluid jet made of a mixture containing a partially fluorinated hydrocarbon and a photo- or thermo-chemically activatable halogen source
 
: Mayer, K.; Kolbesen, B.

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Frontpage ()

DE 102006030588 A: 20060703
DE 102006030588 A: 20060703
C23F0001
German
Patent, Electronic Publication
Fraunhofer ISE ()

Abstract
(A1) Die vorliegende Erfindung betrifft ein Verfahren zum Materialabtrag an Festkoerpern durch Fluessigkeitsstrahl-gefuehrtes Aetzen. Verwendung findet das erfindungsgemaesse Verfahren insbesondere zum Schneiden, Mikrostrukturieren, Dotieren von Wafern oder auch deren Metallisierung.

 

DE 102006030588 A1 UPAB: 20080324 NOVELTY - Etching of material from the surface of solid bodies by at least a laminar fluid jet made of a mixture containing at least a partially fluorinated 4-14C hydrocarbon and at least a photo- or thermo-chemically activatable halogen source, is claimed. USE - The etching process is useful for cutting, micro-structuring, doping of solids and/or local deposition of external elements on solid bodies, in particular silicon wafers (claimed). ADVANTAGE - The process quickly etches the material without any formation of by-products. The hexafluorobenzene (as solvent) used in the process in non-toxic.

: http://publica.fraunhofer.de/documents/N-75286.html