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Design and fabrication of micromirror arrays for UV-lithography

: Lakner, H.; Dürr, P.; Dauderstädt, U.; Doleschal, W.; Amelung, J.

Motamedi, M.E.:
MOEMS and miniaturized systems II. Proceedings : 22-24 Oct. 2000, San Francisco, USA
Bellingham/Wash.: SPIE, 2001 (SPIE Proceedings Series 4561)
ISBN: 0-8194-4289-5
pp.255-264 : Lit.
Conference on MOEMS and Miniaturized Systems <2, 2001, San Francisco/Calif.>
Conference Paper
Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()
micromirror; SLM; UV; pattern generation; MOEMS; Lithographie; CMOS

Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to handle ultraviolet light (UV). We designed and fabricated micromirror arrays which fulfill these requirements. Possible applications for such UV-SLMs are direct writing systems for semiconductor and printing, and UV-stimulates biochemistry. For deep UV laser pattern generation (248 nm) e. g. we designed and fabricated a 2048x512 pixel UV-SLM with individually addressable aluminum micromirrors. They are illuminated by an excimer laser pulse and imaged onto a photomask substrate. A complete pattern is stitched together at a rate of 1 kHz. The minimum feature size is 320 nm and analog modulation of the pixels allows to realize an address grid of only 1.6 nm. The design of the array is modular so that other array sizes can be tailor made to customers needs. Design and farbication aspects for a CMOS compatible realization of these micromirror arrays are addresses as well as their performance in lithography applications.