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Mechanisms involved in the formation of phosphosilicate glass by dehydration of sprayed phosphoric acid in an in-line diffusion furnace

 
: Voyer, C.; Biro, D.; Buettner, T.; Preu, R.

:
Fulltext urn:nbn:de:0011-n-735359 (237 KByte PDF)
MD5 Fingerprint: dea95e3be0e696d369cdbe673a41268a
Created on: 26.9.2012


European Commission, Joint Research Centre -JRC-:
The compiled state-of-the-art of PV solar technology and deployment. 22nd European Photovoltaic Solar Energy Conference, EU PVSEC 2007. Proceedings of the international conference. CD-ROM : Held in Milan, Italy, 3 - 7 September 2007
München: WIP-Renewable Energies, 2007
ISBN: 3-936338-22-1
pp.1630-1633
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <22, 2007, Milano>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
This work studies phosphosilicate glass (PSG) formation from a thin sprayed-on dopant source layer in order to increase the ability of controlling the emitter doping profile. The dopant source contains DI water, 2.5 wt% H3PO4 and a small quantity of surfactants. Most of the layer volume evaporates at the height of the furnace entrance. The further evolution of the dopant source layer composition is described through the dehydrative condensation of H3PO4 and through the reactions between the sprayed-on layer and the Si wafer. The final PSG composition is characterized by means of X-ray photoelectron spectroscopy (XPS). Furthermore, ellipsometry measurements of PSG thickness show that faster heating rates lead to thicker PSG. Finally, it is shown that a thinner dopant source layer results in a lower P surface concentration Cs and, at least in the case of fast heating rates, to a deeper emitter.

: http://publica.fraunhofer.de/documents/N-73535.html