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Thermal oxidation and wet chemical cleaning of silicon wafers for industrial solar cell production

: Lemke, A.; Furtwängler, H.; Rentsch, J.; Biro, D.; Preu, R.

Fulltext urn:nbn:de:0011-n-735026 (95 KByte PDF)
MD5 Fingerprint: 3b13011705f4a7459f9f622f68ca15c7
Created on: 29.9.2012

European Commission, Joint Research Centre -JRC-:
The compiled state-of-the-art of PV solar technology and deployment. 22nd European Photovoltaic Solar Energy Conference, EU PVSEC 2007. Proceedings of the international conference. CD-ROM : Held in Milan, Italy, 3 - 7 September 2007
München: WIP-Renewable Energies, 2007
ISBN: 3-936338-22-1
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <22, 2007, Milano>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

In this work an investigation of the usability of the thermal oxidation process for the industrial solar cell production was analysed. It was investigated if a high passivation quality of the oxide under industrial conditions can be realized and so far surface recombination velocities about 70 cm/s for a full industrial process are reached (material properties: FZ-material, 330 µm, 1 Ohm*cm, 125*125 mm2). The full industrial process includes wet chemical cleaning, handling of the wafers via automation, the oxidation process and a following annealing or rather alnealing step.