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Characterization of electroless nickel plating on silicon solar cells for the front side metallization

: Aleman, M.; Bay, N.; Fabritius, M.; Glunz, S.W.

Fulltext urn:nbn:de:0011-n-734292 (852 KByte PDF)
MD5 Fingerprint: a739be095fbc5758abb0aebfce8b0d7f
Created on: 21.9.2012

European Commission, Joint Research Centre -JRC-:
The compiled state-of-the-art of PV solar technology and deployment. 22nd European Photovoltaic Solar Energy Conference, EU PVSEC 2007. Proceedings of the international conference. CD-ROM : Held in Milan, Italy, 3 - 7 September 2007
München: WIP-Renewable Energies, 2007
ISBN: 3-936338-22-1
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <22, 2007, Milano>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

The selective deposition of nickel on silicon wafers from an electroless bath is a very attractive process for the front side metallization of silicon solar cells. The anti-reflection coating (ARC) at the front side of the wafers is used as a mask for the deposition. Nickel is plated from an alkaline nickel sulfate bath with sodium hypophosphite as a reducing agent and ammonia for pH control. Characterization of the deposition depending on bath conditions, substrate doping and light application will be presented in this paper. Silicon solar cells with SiO2 and SiNx as ARC have been processed featuring dielectric passivation and Laser Fired Contacts (LFC) at the back side. Efficiencies up to 18.9% have been achieved using this technology. The samples have been characterized by SEM and measurement of the IV curves.