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In-situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thicknesses attainable with ellipsometry and photometry

: Vergöhl, M.; Malkomes, N.; Matthee, T.; Bräuer, G.; Richter, U.; Nickol, F.-W.; Bruch, J.


Thin solid films 392 (2001), No.2, pp.258-264
ISSN: 0040-6090
International Conference on Coatings on Glass (ICCG) <3, 2000, Maastricht>
Conference Paper, Journal Article
Fraunhofer IST ()
optical coating; ellipsometry; optical spectroscopy; in-situ ellipsometry

For the deposition of optical coatings on architectural glass, spectroscopic ellipsometry and spectral photometry have been applied. For the purpose of achieving a high competitiveness of manufacturing plants, high deposition rates as well as low scrap quanitities are important. The first can be obtained by using the mid-frequency (MF) sputtering technique developed in the beginning of the nineties for the deposition of highly isolating materials. The latter can be improved by using an effective plasma control and a monitor of the optical film properties. In order to obtain constant layer properties, not only the MF but also the directcurrent (DC) sputter process has to be stabilized within a relatively narrow process window, which necessitates a suitable plasma control as well as optical monitoring. Spectroscopic ellipsometry as well as spectral photometry are used for monitoring the optical properties of SnO2-based low-e-coatings on architectural glass. It is estimated that spectroscopic ellipsometry is distinctly more sensitive for monitoring the thicknesses of low-e coatings than spectral photometry.