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EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates

 
: Schröder, S.; Feigl, T.; Duparre, A.; Tünnermann, A.

:
Postprint (1.9 MByte; PDF; )

Optics Express 15 (2007), No.21, pp.13997-14012
ISSN: 1094-4087
English
Journal Article, Electronic Publication
Fraunhofer IOF ()
scattering measurement; reflection; surface measurement; roughness; thin film; extreme ultraviolet

Abstract
Highly reflective Molybdenum/Silicon multilayer mirrors for 13.5 nm are characterized at-wavelength using a new laboratory size measurement system for EUV reflectance and scattering. Roughness analysis before and after coating by Atomic Force Microscopy indicates roughness enhancement as well as smoothing effects during thin film growth. The impact of the substrate finish and the deposition process onto the scattering distribution and scatter losses with regard to the specular reflectance is analyzed.

: http://publica.fraunhofer.de/documents/N-67870.html