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Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime

 
: Erdmann, A.; Evanschitzky, P.

:

Journal of Microlithography, Microfabrication, and Microsystems 6 (2007), No.3, Art. 031002, 16 pp.
ISSN: 1537-1646
English
Journal Article
Fraunhofer IIS ()
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-67776.html