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Large area ZnO:Al films with tailored light scattering properties for photovoltaic applications

: Ruske, F.; Jacobs, C.; Sittinger, V.; Szyszka, B.; Werner, W.


Baraton, M.-I.:
First International Symposium on Transparent Conducting Oxides, 1st IS TCO 2006 : Held in Crete in Greece, from 23 to 25 October 2006
Amsterdam: Elsevier, 2007 (Thin solid films 515.2007, Nr.24)
International Symposium on Transparent Conducting Oxides (IS TCO) <1, 2006, Heraklion>
Conference Paper, Journal Article
Fraunhofer IST ()
al-doped zinc oxide; magnetron sputtering; thin film solar cell; wet chemical etching; light scattering property

Aluminum-doped zinc oxide films on glass are promising substrates for use in thin film solar cells based on amorphous and amorphous/microcrystalline silicon absorber material. The films can be produced by magnetron sputtering on large scale at relative low cost. Especially reactive sputtering of metallic Zn/Al compound targets is a cheap way to produce films at high deposition rate. One drawback of amorphous silicon is the low absorption in the near infrared spectral range. Wet chemical etching has been used to produce a rough TCO surface that enables light trapping in the absorber. The etching behaviour of ZnO:Al films can be tuned by changing oxygen partial pressure during deposition. The etching behaviour is compared to ZnO structure and discussed regarding the performance of solar cells deposited onto the etched films.