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Investigation of HPPMS titania thin films prepared by unipolar, DC-superimposed and bipolar sputtering

: Bandorf, R.; Vergöhl, M.; Giesel, P.; Wallendorf, T.; Mark, G.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. Technical Conference Proceedings 1991-2007. CD-ROM
Albuquerque: SVC, 2007
Society of Vacuum Coaters (Annual Technical Conference) <50, 2007, Louisville/KY>
Conference Paper
Fraunhofer IST ()

Titania films are an important material for various applications. Applications are as photo catalytic and optical films, e.g. in multilayered optical filters. Of general importance are properties like density, micro hardness, wear resistance, refractive and absorption index and electrical insulation. Depending on application, one of these properties has to be optimized. From economic point of view, general process properties like high deposition rate as well as a ìcleanî environment have to be fulfilled. The latter is also important for electrical and optical applications where defect free films are required.
In the present paper, titania thin films were deposited by high ionized pulsed magnetron sputtering at high target power. Properties of the deposited films are characterized and discussed. The investigated pulse modes were unipolar and bipolar HPPMS, as well as dc-superimposed unipolar HPPMS. The modification of the deposition rate and the resulting film properties are discussed.