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Fabrication of textured solar cells using sprayed phosphoric acid as the dopant source for the in-line emitter diffusion

: Voyer, C.; Biro, D.; Wagner, K.; Benick, J.; Preu, R.

Fulltext urn:nbn:de:0011-n-666513 (801 KByte PDF)
MD5 Fingerprint: e24a46ff515151539604f9f3e07f6b08
Created on: 3.10.2012

Poortmans, J. ; European Commission, Joint Research Centre -JRC-:
21st European Photovoltaic Solar Energy Conference 2006. Proceedings. CD-ROM : Proceedings of the international conference held in Dresden, Germany, 4 - 8 September 2006
München: WIP-Renewable Energies, 2006
ISBN: 3-936338-20-5
European Photovoltaic Solar Energy Conference <21, 2006, Dresden>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Solar cells were fabricated from textured boron-doped Cz-Si 125Ã 125 mm2 pseudo-square wafers with a bulk resistivity of 0.5-1.7 ohm cm or 3-6 ohm cm. The emitter was formed by spraying a solution consisting of 3% w/w phosphoric acid in DI water and of a small quantity of surfactant onto the wafer and by subsequent diffusion at 880°C in a contamination-free in-line furnace. The contacts were formed using standard screen-printing and in-line fast firing. Sheet resistance Rsh was in the range of 38-43 ohm/sq and the cells yielded efficiencies of up to 17.5%. Fill factors of up to 79.1% indicate adequate emitter homogeneity on a microscopic scale. Some factors influencing Rsh homogeneity across a wafer were dentified, such as the movement of the drying front of the sprayed layer. A Rsh variation of approx. ±3 ohm/sq was measured on 125x125 mm2 pseudo-square wafers with an avg. Rsh of ~50 ohm/sq.