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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Application of electron tomography for semiconductor device analysis

 
: Kübel, C.; Kujawa, M.; Luo, J.-S.; Lo, H.M.; Russel, J.D.

:

Zschech, E. ; American Institute of Physics -AIP-, New York:
Stress-induced phenomena in metallization : Eighth International Workshop on Stress-Induced Phenomena in Metallization. Dresden, Germany, 12 - 14 September 2005
New York, N.Y.: AIP Press, 2006 (AIP conference proceedings 817)
ISBN: 0-7354-0310-4
pp.223-228
International Workshop on Stress Induced Phenomena in Metallization <8, 2005, Dresden>
English
Conference Paper
Fraunhofer IFAM ()

: http://publica.fraunhofer.de/documents/N-66475.html