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Surface characterization of optical components for the DUV, VUV und EUV

 
: Duparre, A.; Kozhevnikov, I.; Gliech, S.; Steinert, J.; Notni, G.

:

Microelectronic engineering 57-58 (2001), pp.65-70
ISSN: 0167-9317
English
Journal Article
Fraunhofer IOF ()
193 nm optics; 157 nm optics; EUV coatings; surface roughness; light scattering

Abstract
Total light scattering measurements (TS) at 248 nm, 193 nm and 157 nm, atomic force microscopy (AFM) and X-ray scattering (XRS) are used to characterize optical components for the DUV/VUV and EUV regions. Power spectral densities (PSD) were calculated for comprehensive roughness analysis. Examples of measurements on CaF, substrates and fluoride multilayer coatings for DUV/VUV applications as well as on Mo films for use in EUV optics are presented.

: http://publica.fraunhofer.de/documents/N-6330.html