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Simulation of proximity and contact lithography

 
: Meliorisz, B.; Evanschitzky, P.; Erdmann, A.

:

Microelectronic engineering 84 (2007), No.5-8, pp.733-736
ISSN: 0167-9317
English
Journal Article
Fraunhofer IISB ()

Abstract
A simulation method based on scalar diffraction analysis of proximity and contact lithography is presented and compared with rigorous electromagnetic calculations in terms of accuracy and computation cost. It is shown that the error ofthe diffraction method is tolerable for standard lithography processes. Several examples demonstrate the integration of the new method in a typical lithographic process flow.

: http://publica.fraunhofer.de/documents/N-62023.html