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Modelling of Crystal Growth for Sputtered Layers by Molecular Dynamics

: Gottwald, B.; Gemmler, A.; Westkämper, E.; Klein, P.

European Society for Precision Engineering and Nanotechnology -EUSPEN-:
Euspen 2nd International Conference 2001. Proceedings
Turin, 2001
pp.160-163 (Vol.1)
European Society for Precision Engineering and Nanotechnology (International Conference) <2, 2001, Turin>
Conference Paper
Fraunhofer IPA ()
Sputtertechnik; coating technology; Layer Manufacturing Technology (LMT); simulation; Schutzschicht

The authors are working on a simulation tool for sputtered coatings on the basis of molecular dynamics leading to a direct correlation of atomistic indicators with determinable mesoscopic layer characteristics. The aim is to compute the material properties of the layer-substrate system and its behaviour within the coating process. The data derived from the molecular-dynamic simulation process will be compared with real measurement results. Long-term target is to apply the molecular-dynamic simulation for specific layer engineering.