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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Formation of multiple current filaments and the effect of filament confinement in silicon based PIN diodes
| Institute of Electrical and Electronics Engineers -IEEE-; National Institute for Research and Development in Microtechnologies, Bucharest: IEEE 43rd International Semiconductor Conference, CAS 2020. Proceedings : October 7-9, 2020, Romania, Virtual Event Piscataway, NJ: IEEE, 2020 ISBN: 978-1-7281-1072-1 pp.217-220 |
| International Semiconductor Conference (CAS) <43, 2020, Online> |
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| English |
| Conference Paper |
| Fraunhofer IIS, Institutsteil Entwurfsautomatisierung (EAS) () |
Abstract
Electrostatic discharge (ESD) can be considered as one of the main reliability risks of modern electronic systems which causes failure of semiconductor devices by an over-current effect. One of the dominant failure mechanisms during an ESD event is thermal runaway caused by an avalanche breakdown leading to an inhomogeneous current flow and a current filament. Here, the formation and motion of current filaments are investigated on special test structures of silicon based PIN diodes using technology computer-aided design (TCAD) simulations and transmission line pulse (TLP) measurements. In thin structures a constriction of the filament occurs as well as the formation of multiple filaments is observed.