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Formation of a crack-free and debonding-resistant boron-doped diamond thin film on titanium using a dual-coating strategy

 
: Lowe, M.A.; Fischer, A.E.; Swain, G.M.

:

Journal of the Electrochemical Society 153 (2006), No.11, pp.B506-B511
ISSN: 0013-4651
English
Journal Article
Fraunhofer IWS ()

Abstract
Producing continuous, conductive diamond film on titanium is critical to using this metal for electrochemical electrodes, bipolar current collector plates in fuel cells, and prosthetic implants. A common problem with coating polycrystalline diamond on titanium is the stress-cracking that results from the difference of a factor of 10 in the thermal expansion coefficient for the two materials. A dual coating strategy was evaluated for its effectiveness at forming stress-free thin films of boron-doped diamond on titanium. Using microwave plasma-assisted chemical vapor deposition, a layer of boron-doped nanocrystalline diamond was first deposited on titanium, followed by deposition of a layer of boron-doped microcrystalline diamond.

: http://publica.fraunhofer.de/documents/N-59687.html